Alternative to classic annealing treatments for fractally patterned TiO{sub 2} thin films

Journal Article · Sat Nov 15 00:00:00 EST 2008 · Journal of Applied Physics

DOI:https://doi.org/10.1063/1.3021161· OSTI ID:21185910

Overschelde, O van; Wautelet, M ^[1]; Guisbiers, G ^[2]; Hamadi, F ^[3]; Hemberg, A ^[4]; Snyders, R ^[4]

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1. Physics of Condensed Matter, University of Mons-Hainaut, Avenue Maistriau 23, 7000 Mons (Belgium)
2. CICECO, Campus Santiago, University of Aveiro, 3810-193 Aveiro (Portugal)
3. Advanced Technologies Development Centre (CDTA), P.O. Box 17, Baba-Hassen Algiers (Algeria)
4. Inorganic and Analytical Chemistry, University of Mons-Hainaut, 1 Avenue Copernic, 7000 Mons (Belgium)

Titanium dioxide thin films have been deposited by reactive magnetron sputtering on glass and subsequently irradiated by UV radiation using a KrF excimer laser. The influence of the laser fluence (F) on the constitution and microstructure of the deposited films is studied for 0.05<F<0.40 J/cm{sup 2}. The diffraction data reveal that as deposited films are amorphous, while irradiated films present an anatase structure. Additional Raman spectroscopy study shows better crystal quality for the films irradiated with F<0.13 J/cm{sup 2}. The film morphology appears to be strongly modified after laser treatment. Atomic force microscopy and scanning electron microscopy measurements reveal fractally textured films presenting characteristics of high porosity and high specific surface area. Finally, contact angle analysis suggests hydrophobic or wetting behavior depending on F. In order to explain the laser-induced structuration mechanisms, we have successfully applied a fractal as well as the nucleation theories. We propose that electronics effects could be responsible for the observed crystallization.

• OSTI ID: 21185910
• Journal Information: Journal of Applied Physics, Vol. 104, Issue 10; Other Information: DOI: 10.1063/1.3021161; (c) 2008 American Institute of Physics; Country of input: International Atomic Energy Agency (IAEA); ISSN 0021-8979
• Country of Publication: United States
• Language: English

Related Subjects

36 MATERIALS SCIENCE
ANNEALING
ATOMIC FORCE MICROSCOPY
CRYSTAL STRUCTURE
CRYSTALLIZATION
DEPOSITION
GLASS
KRYPTON FLUORIDE LASERS
MICROSTRUCTURE
MORPHOLOGY
NUCLEATION
POROSITY
RAMAN SPECTRA
RAMAN SPECTROSCOPY
SCANNING ELECTRON MICROSCOPY
SEMICONDUCTOR MATERIALS
SPECIFIC SURFACE AREA
SPUTTERING
THIN FILMS
TITANIUM OXIDES
ULTRAVIOLET RADIATION