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Quantum resistance metrology in graphene

Journal Article · · Applied Physics Letters
DOI:https://doi.org/10.1063/1.3043426· OSTI ID:21175796
; ;  [1]; ;  [2]; ; ;  [3]
  1. High Field Magnet Laboratory, Institute for Molecules and Materials, Radboud University Nijmegen, Toernooiveld 7, 6525 ED Nijmegen (Netherlands)
  2. NMi Van Swinden Laboratorium BV, Thijsseweg 11, 2629 JA Delft (Netherlands)
  3. Department of Physics, University of Manchester, M13 9PL Manchester (United Kingdom)
We performed a metrological characterization of the quantum Hall resistance in a 1 {mu}m wide graphene Hall bar. The longitudinal resistivity in the center of the {nu}={+-}2 quantum Hall plateaus vanishes within the measurement noise of 20 m{omega} up to 2 {mu}A. Our results show that the quantization of these plateaus is within the experimental uncertainty (15 ppm for 1.5 {mu}A current) equal to that in conventional semiconductors. The principal limitation of the present experiments is the relatively high contact resistances in the quantum Hall regime, leading to a significantly increased noise across the voltage contacts and a heating of the sample when a high current is applied.
OSTI ID:
21175796
Journal Information:
Applied Physics Letters, Journal Name: Applied Physics Letters Journal Issue: 22 Vol. 93; ISSN APPLAB; ISSN 0003-6951
Country of Publication:
United States
Language:
English

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