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Title: Microwave-excited atmospheric-pressure plasma jets using a microstrip line

Journal Article · · Applied Physics Letters
DOI:https://doi.org/10.1063/1.3025841· OSTI ID:21175746
 [1];  [2]; ;  [3]
  1. Nano-Coating Team, Nanotube Research Center, National Institute of Advanced Industrial Science and Technology, Central 5, Higashi 1-1-1, Tsukuba, Ibaraki 305-8565 (Japan)
  2. Tokyo Bunkyo Study Center, Open University of Japan, 3-29-1 Ostuka, Bukyo, Tokyo 112-0012 (Japan)
  3. Department of Advanced Energy, Graduate School of Frontier Sciences, University of Tokyo, 5-1-5 Kashiwanoha, Kashiwa-shi, Chiba 277-8561 (Japan)

We report a 2.45 GHz microwave-excited atmospheric-pressure plasma jet (MW-APPJ) device using a microstrip line for materials processing. A three-dimensional simulation based on the finite difference time domain method revealed that the configuration of the MW-APPJ device results in a strong concentration of electric fields at the gas nozzle. Argon plasmas were generated at the nozzle and were blown into ambient air with the maximum length of 5 mm at a microwave power of 40 W. The rotational temperatures of molecular nitrogen in the downstream of the plasma jets, measured by optical emission spectroscopy, were 1720 to 900 K for gas flow rates from 0.5 to 3.5 l/min, indicating that the jets were nonthermal plasmas. This MW-APPJ device will provide a large-area APPJ for materials processing depending on the configuration of the nozzle array and microstrip lines.

OSTI ID:
21175746
Journal Information:
Applied Physics Letters, Vol. 93, Issue 19; Other Information: DOI: 10.1063/1.3025841; (c) 2008 American Institute of Physics; Country of input: International Atomic Energy Agency (IAEA); ISSN 0003-6951
Country of Publication:
United States
Language:
English