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Preparation and Characterization of PZT Thin Films

Journal Article · · AIP Conference Proceedings
DOI:https://doi.org/10.1063/1.2971989· OSTI ID:21149148
; ; ;  [1];  [2]
  1. Central Glass and Ceramic Research Institute, CSIR, 196 Raja S.C. Mullick Road, Kolkata-700032 (India)
  2. National Physical Laboratory, Dr. K.S. Krishnan Road, New Delhi-110012 (India)

In analogy with Piezoelectric Wafer Active Sensors (PWAS), Lead Zirconate Titanate (PZT) thin films also seem to be promising for Structural Health Monitoring (SHM) due to a number of reasons. Firstly, PZT thin films with well oriented domains show enhanced piezoelectric response. Secondly, PWAS requires comparatively large voltage leading to a demand for thin PZT films (<< {mu}m in thickness) for low voltage operation at {<=}10 V. This work focuses on two different aspects: (a) growing oriented PZT thin films in ferroelectric perovskite phase in the range of (80-150) nm thickness on epitaxial Si/Pt without a seed layer and (b) synthesizing perovskite phase in PZT thin films on Corning glass 1737 using a seed layer of TiO{sub x} (TiO{sub x} thickness ranging between 30 nm to 500 nm)

OSTI ID:
21149148
Journal Information:
AIP Conference Proceedings, Journal Name: AIP Conference Proceedings Journal Issue: 1 Vol. 1029; ISSN APCPCS; ISSN 0094-243X
Country of Publication:
United States
Language:
English