Inverted end-Hall-type low-energy high-current gaseous ion source

Journal Article · Fri Feb 15 04:00:00 EST 2008 · Review of Scientific Instruments

DOI:https://doi.org/10.1063/1.2801348· OSTI ID:21103962

Oks, E M; Vizir, A V; Shandrikov, M V; Yushkov, G Yu; Grishin, D M; Anders, A; Baldwin, D A ^[1]

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1. High Current Electronics Institute, Russian Academy of Sciences, Tomsk 634055 (Russian Federation)

A novel approach to low-energy, high-current, gaseous ion beam generation was explored and an ion source based on this technique has been developed. The source utilizes a dc high-current (up to 20 A) gaseous discharge with electron injection into the region of ion generation. Compared to the conventional end-Hall ion source, the locations of the discharge anode and cathode are inverted: the cathode is placed inside the source and the anode outside, and correspondingly, the discharge current is in the opposite direction. The discharge operates in a diverging axial magnetic field, similar to the end-Hall source. Electron generation and injection is accomplished by using an additional arc discharge with a ''cold'' (filamentless) hollow cathode. Low plasma contamination is achieved by using a low discharge voltage (avoidance of sputtering), as well as by a special geometric configuration of the emitter discharge electrodes, thereby filtering (removing) the erosion products stemming from the emitter cathode. The device produces a dc ion flow with energy below 20 eV and current up to 2.5 A onto a collector of 500 cm{sup 2} at 25 cm from the source edge, at a pressure {>=}0.02 Pa and gas flow rate {>=}14 SCCM. The ion energy spread is 2 to 3 eV (rms). The source is characterized by high reliability, low maintenance, and long lifetime. The beam contains less than 0.1% of metallic ions. The specific electric energy consumption is 400 eV per ion registered at the collector. The source operates with noble gases, nitrogen, oxygen, and hydrocarbons. Utilizing biasing, it can be used for plasma sputtering, etching, and other ion technologies.

• OSTI ID: 21103962
• Journal Information: Review of Scientific Instruments, Journal Name: Review of Scientific Instruments Journal Issue: 2 Vol. 79; ISSN 0034-6748; ISSN RSINAK
• Country of Publication: United States
• Language: English

Related Subjects

71 CLASSICAL AND QUANTUM MECHANICS
GENERAL PHYSICS
ANODES
ELECTRIC ARCS
ELECTRIC POTENTIAL
ELECTRON BEAM INJECTION
ELECTRONS
ENERGY CONSUMPTION
HOLLOW CATHODES
HYDROCARBONS
ION BEAMS
ION SOURCES
MAGNETIC FIELDS
NITROGEN
OXYGEN
PLASMA
RARE GASES
SPUTTERING