Deposition of transparent conductive mesoporous indium tin oxide thin films by a dip coating process

Journal Article · Tue Apr 01 04:00:00 EDT 2008 · Materials Research Bulletin

DOI:https://doi.org/10.1016/j.materresbull.2007.04.021· OSTI ID:21068252

Wenjian, Wu; Tian, Tian; Yahui, Man; Jianfang, Wang ^[1]

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1. College of Aerospace and Materials Engineering, National University of Defense Technology, Changsha 410073 (China)

Cetyltrimethyl ammonium bromide (CTAB) templated mesoporous indium tin oxide (ITO) thin films were deposited on quartz plates by an evaporation-induced self-assembly (EISA) process using a dip coating method. The starting solution was prepared by mixing indium chloride, tin chloride, and CTAB dissolved in ethanol. Five to fifty mole percent Sn-doped ITO films were prepared by heat-treatment at 400 deg. C for 5 h. The structural, adsorptive, electrical, and optical properties of mesoporous ITO thin films were investigated. Results indicate that the mesoporous ITO thin films have an ordered two-dimensional hexagonal (p6mm) structure, with nanocrystalline domains in the inorganic oxide framework. The continuous thin films have highly ordered pore sizes (>20 A), high Brunauer-Emmett-Teller (BET) surface area up to 340 m{sup 2}/g, large pore volume (>0.21 cm{sup 3}/g), outstanding transparency in the visible range (>80%), and show a minimum resistivity of {rho} = 1.2 x 10{sup -2} {omega} cm.

• OSTI ID: 21068252
• Journal Information: Materials Research Bulletin, Journal Name: Materials Research Bulletin Journal Issue: 4 Vol. 43; ISSN MRBUAC; ISSN 0025-5408
• Country of Publication: United States
• Language: English

Related Subjects

36 MATERIALS SCIENCE
AMMONIUM COMPOUNDS
BROMIDES
DIP COATING
DOPED MATERIALS
EVAPORATION
HEAT TREATMENTS
INDIUM CHLORIDES
INDIUM OXIDES
OPACITY
SURFACE AREA
TEMPERATURE RANGE 0400-1000 K
THIN FILMS
TIN CHLORIDES
TIN OXIDES
X-RAY DIFFRACTION