Facile fabrication of SiO{sub 2}/Al{sub 2}O{sub 3} composite microspheres with a simple electrostatic attraction strategy
Journal Article
·
· Materials Research Bulletin
- State Key Lab of Advanced Technology for Materials Synthesis and Processing, Wuhan University of Technology, Luoshi Road 122, Wuhan 430070 (China)
SiO{sub 2}/Al{sub 2}O{sub 3} composite microspheres with SiO{sub 2} core/Al{sub 2}O{sub 3} shell structure and high surface area were prepared by depositing Al{sub 2}O{sub 3} colloid particles on the surface of monodispersed microporous silica microspheres using a simple electrostatic attraction and heterogeneous nucleation strategy, and then calcined at 600 deg. C for 4 h. The prepared products were characterized with differential thermal analysis and thermogravimetric analysis (DTA/TG), scanning electron microscopy (SEM), transmission electron microscopy (TEM), nitrogen adsorption and X-ray photoelectron spectroscopy (XPS). It was found that uniform alumina coating could be deposited on the surface of silica microspheres by adjusting the pH values of the reaction solution to an optimal pH value of about 6.0. The specific surface area and pore volume of the SiO{sub 2}/Al{sub 2}O{sub 3} composite microspheres calcined at 600 deg. C were 653 m{sup 2} g{sup -1} and 0.34 ml g{sup -1}, respectively.
- OSTI ID:
- 21068224
- Journal Information:
- Materials Research Bulletin, Journal Name: Materials Research Bulletin Journal Issue: 3 Vol. 43; ISSN MRBUAC; ISSN 0025-5408
- Country of Publication:
- United States
- Language:
- English
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Related Subjects
36 MATERIALS SCIENCE
ADSORPTION
ALUMINIUM OXIDES
COLLOIDS
DIFFERENTIAL THERMAL ANALYSIS
MICROSPHERES
SCANNING ELECTRON MICROSCOPY
SILICA
SILICON OXIDES
SOL-GEL PROCESS
SPECIFIC SURFACE AREA
SURFACE AREA
TEMPERATURE RANGE 0400-1000 K
THERMAL GRAVIMETRIC ANALYSIS
TRANSMISSION ELECTRON MICROSCOPY
X-RAY PHOTOELECTRON SPECTROSCOPY
ADSORPTION
ALUMINIUM OXIDES
COLLOIDS
DIFFERENTIAL THERMAL ANALYSIS
MICROSPHERES
SCANNING ELECTRON MICROSCOPY
SILICA
SILICON OXIDES
SOL-GEL PROCESS
SPECIFIC SURFACE AREA
SURFACE AREA
TEMPERATURE RANGE 0400-1000 K
THERMAL GRAVIMETRIC ANALYSIS
TRANSMISSION ELECTRON MICROSCOPY
X-RAY PHOTOELECTRON SPECTROSCOPY