Monochromatic Soft X-Ray Self-Emission Imaging in Dense Z Pinches

Journal Article · Thu Aug 02 04:00:00 EDT 2007 · AIP Conference Proceedings

DOI:https://doi.org/10.1063/1.2768855· OSTI ID:21067343

Jones, B; Coverdale, C A; Peterson, K J ^[1]; Deeney, C ^[2]; Meyer, C J; LePell, P D ^[3]; Apruzese, J P; Clark, R W; Davis, J ^[4]

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1. Sandia National Laboratories, PO Box 5800, Albuquerque, NM 87185 (United States)
2. National Nuclear Security Administration, Washington, DC 20585 (United States)
3. Ktech Corp., Albuquerque, NM 87123 (United States)
4. Naval Research Laboratory, Washington, DC 20375 (United States)

The Z machine at Sandia National Laboratories drives 20 MA in 100 ns through a cylindrical array of fine wires which implodes due to the strong j x B force, generating up to 250 TW of soft x-ray radiation when the z-pinch plasma stagnates on axis. The copious broadband self-emission makes the dynamics of the implosion well suited to diagnosis with soft x-ray imaging and spectroscopy. A monochromatic self-emission imaging instrument has recently been developed on Z which reflects pinhole images from a multilayer mirror onto a 1 ns gated microchannel plate detector. The multilayer can be designed to provide narrowband ({approx}10 eV) reflection in the 100-700 eV photon energy range, allowing observation of the soft emission from accreting mass as it assembles into a hot, dense plasma column on the array axis. In the present instrument configuration, data at 277 eV photon energy have been obtained for plasmas ranging from Al to W, and the z-pinch implosion and stagnation will be discussed along with > 1 keV self-emission imaging and spectroscopy. Collisional-radiative simulations are currently being pursued in order to link the imaged emissivity to plasma temperature and density profiles and address the role of opacity in interpreting the data.

• OSTI ID: 21067343
• Journal Information: AIP Conference Proceedings, Journal Name: AIP Conference Proceedings Journal Issue: 1 Vol. 926; ISSN APCPCS; ISSN 0094-243X
• Country of Publication: United States
• Language: English

Related Subjects

70 PLASMA PHYSICS AND FUSION TECHNOLOGY
ELECTRON TEMPERATURE
EMISSION SPECTROSCOPY
EMISSIVITY
EV RANGE
EXPLODING WIRES
IMPLOSIONS
ION TEMPERATURE
KEV RANGE
LINEAR Z PINCH DEVICES
MICROCHANNEL ELECTRON MULTIPLIERS
MONOCHROMATIC RADIATION
OPACITY
PLASMA
PLASMA DIAGNOSTICS
REFLECTION
SOFT X RADIATION