Role of oxygen vacancies on ferromagnetism in Fe-doped TiO{sub 2} thin films

Journal Article · Mon Oct 01 00:00:00 EDT 2007 · Journal of Applied Physics

DOI:https://doi.org/10.1063/1.2786115· OSTI ID:21062130

Meng, H J; Hou, D L; Jia, L Y; Ye, X J; Zhou, H J; Li, X L ^[1]

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1. College of Physical Science and Information Engineering, Hebei Normal University, Shijiazhuang 050016 (China)

Fe-doped TiO{sub 2} rutile thin films were fabricated by reactive magnetron sputtering on SiO{sub 2} substrates under different growth conditions, and the structure and magnetism have been systematically investigated. X-ray diffraction data, atomic force microscopy, and magnetic force microscopy confirm the absence of metallic Fe clusters or any other impurity phase. The divalent Fe ion was identified by x-ray photoelectron spectra. Room-temperature ferromagnetism has been observed for all the Fe{sub x}Ti{sub 1-x}O{sub 2} (x=3%-15%) rutile films. However, the saturation magnetization (M{sub s}) varied drastically for different pressures, doping concentrations, and annealing processes. The results show that ferromagnetism originates from the doped matrix rather than any type of magnetic cluster and the ferromagnetism is strongly correlated with the oxygen vacancies in TiO{sub 2}.

• OSTI ID: 21062130
• Journal Information: Journal of Applied Physics, Vol. 102, Issue 7; Other Information: DOI: 10.1063/1.2786115; (c) 2007 American Institute of Physics; Country of input: International Atomic Energy Agency (IAEA); ISSN 0021-8979
• Country of Publication: United States
• Language: English

Related Subjects

36 MATERIALS SCIENCE
ANNEALING
ATOMIC FORCE MICROSCOPY
CRYSTAL GROWTH
DEPOSITION
DOPED MATERIALS
FERROMAGNETIC MATERIALS
FERROMAGNETISM
IRON IONS
MAGNETIC FIELDS
MAGNETIZATION
OXYGEN
RUTILE
SILICON OXIDES
SPUTTERING
TEMPERATURE RANGE 0273-0400 K
THIN FILMS
TITANIUM OXIDES
VACANCIES
X-RAY DIFFRACTION
X-RAY PHOTOELECTRON SPECTROSCOPY