Vacuum ultraviolet photodissociation and surface morphology change of water ice films dosed with hydrogen chloride

Journal Article · Sun Oct 21 04:00:00 EDT 2007 · Journal of Chemical Physics

DOI:https://doi.org/10.1063/1.2794342· OSTI ID:21024341

Yabushita, Akihiro; Kanda, Daichi; Kawanaka, Noboru; Kawasaki, Masahiro ^[1]

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1. Department of Molecular Engineering, Kyoto University, Kyoto 615-8510 (Japan)

Time-of-flight (TOF) spectra of photofragment H atoms from the photodissociation of water ice films at 193 nm were measured for amorphous and polycrystalline water ice films with and without dosing of hydrogen chloride at 100-145 K. The TOF spectrum is sensitive to the surface morphology of the water ice film because the origin of the H atom is the photodissociation of dimerlike water molecules attached to the ice film surfaces. Adsorption of HCl on a polycrystalline ice film was found to induce formation of disorder regions on the ice film surface at 100-140 K, while the microstructure of the ice surface stayed of polycrystalline at 145 K with adsorption of HCl. The TOF spectra of photofragment Cl atoms from the 157 nm photodissociation of neutral HCl adsorbed on water ice films at 100-140 K were measured. These results suggest partial dissolution of HCl on the ice film surface at 100-140 K.

• OSTI ID: 21024341
• Journal Information: Journal of Chemical Physics, Journal Name: Journal of Chemical Physics Journal Issue: 15 Vol. 127; ISSN JCPSA6; ISSN 0021-9606
• Country of Publication: United States
• Language: English

Related Subjects

37 INORGANIC, ORGANIC, PHYSICAL, AND ANALYTICAL CHEMISTRY
ADSORPTION
AMORPHOUS STATE
CRYSTAL STRUCTURE
DISSOCIATION
DISSOLUTION
FILMS
HYDROCHLORIC ACID
ICE
LAYERS
MICROSTRUCTURE
MORPHOLOGY
PHOTOLYSIS
POLYCRYSTALS
SURFACES
TEMPERATURE RANGE 0065-0273 K
TIME-OF-FLIGHT METHOD
ULTRAVIOLET RADIATION
WATER