Transport properties of microstructured ultrathin films of La{sub 0.67}Ca{sub 0.33}MnO{sub 3} on SrTiO{sub 3}

Journal Article · Mon Aug 06 00:00:00 EDT 2007 · Applied Physics Letters

DOI:https://doi.org/10.1063/1.2756166· OSTI ID:21016089

Beekman, C; Komissarov, I; Hesselberth, M; Aarts, J ^[1]

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1. Kamerlingh Onnes Laboratory, Leiden University, P.O. Box 9504, 2300RA Leiden (Netherlands)

The authors have investigated the electrical transport properties of 8 nm thick La{sub 0.67}Ca{sub 0.33}MnO{sub 3} (LCMO) films, sputter deposited on SrTiO{sub 3} (STO), and etched into 5 {mu}m wide bridges by Ar-ion etching. The authors find that even slight overetching of the film leads to conductance of the STO substrate, and asymmetric and nonlinear current-voltage (I-V) characteristics. However, a brief oxygen plasma etch allows full recovery of the insulating character of the substrate. The I-V characteristics of the bridges are then fully linear over a large range of current densities. The authors find colossal magnetoresistance properties typical for strained LCMO on STO but no signature of nonlinear effects (the so-called electroresistance) connected to electronic inhomogeneites. In the metallic state below 150 K, the highest current densities lead to heating effects and nonlinear I-V characteristics.

• OSTI ID: 21016089
• Journal Information: Applied Physics Letters, Journal Name: Applied Physics Letters Journal Issue: 6 Vol. 91; ISSN APPLAB; ISSN 0003-6951
• Country of Publication: United States
• Language: English

Related Subjects

36 MATERIALS SCIENCE
ARGON IONS
CALCIUM COMPOUNDS
CHARGED-PARTICLE TRANSPORT
CURRENT DENSITY
ETCHING
FERROMAGNETIC MATERIALS
HEATING
LANTHANUM COMPOUNDS
MAGNETORESISTANCE
MANGANATES
OXYGEN
PARAMAGNETISM
PLASMA
RESIDUAL STRESSES
SPUTTERING
STRONTIUM TITANATES
SUBSTRATES
TEMPERATURE DEPENDENCE
TEMPERATURE RANGE 0065-0273 K
THIN FILMS