Surface characterization of plasma-polymerized cyclohexane thin film

Journal Article · Sun Jul 15 04:00:00 EDT 2007 · Journal of Vacuum Science and Technology. A, International Journal Devoted to Vacuum, Surfaces, and Films

DOI:https://doi.org/10.1116/1.2743641· OSTI ID:20979509

Choi, Changrok; Yeo, Sanghak; Shon, Hyun Kyong; Kim, Jeong Won; Moon, Dae Won; Jung, Donggeun; Lee, Tae Geol ^[1]

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1. Department of Physics, Brain Korea 21 Physics Research Division and Institute of Basic Science, Sungkyunkwan University, Suwon 440-746 (Korea, Republic of)

A plasma-polymerized cyclohexane (PPCHex) thin film was characterized by using Fourier transform infrared spectroscopy, x-ray photoelectron spectroscopy, and time-of-flight secondary ion mass spectrometry along with a principal component analysis (PCA). The PPCHex thin film was deposited onto a silicon substrate by using an inductively coupled plasma chemical vapor deposition method and cyclohexane as a precursor. The chemical composition of the PPCHex surface was controlled in a reproducible manner as a function of substrate bias plasma power. A PCA of the TOF-SIMS data also gave systematic insight into the surface chemical compositions and molecular cross-linking on plasma-polymerized thin films as a function of substrate bias plasma power. PPCHex thin film made at 100 W plasma power had the least amount of oxygen functional groups such as the C-O-H form on the surface than the one made at 10 W plasma power.

• OSTI ID: 20979509
• Journal Information: Journal of Vacuum Science and Technology. A, International Journal Devoted to Vacuum, Surfaces, and Films, Journal Name: Journal of Vacuum Science and Technology. A, International Journal Devoted to Vacuum, Surfaces, and Films Journal Issue: 4 Vol. 25; ISSN 1553-1813
• Country of Publication: United States
• Language: English

Related Subjects

36 MATERIALS SCIENCE
CHEMICAL COMPOSITION
CHEMICAL VAPOR DEPOSITION
CROSS-LINKING
CYCLOHEXANE
FOURIER TRANSFORM SPECTROMETERS
FOURIER TRANSFORMATION
INFRARED SPECTRA
ION MICROPROBE ANALYSIS
IONS
MASS SPECTRA
MASS SPECTROSCOPY
OXYGEN
PLASMA
SILICON
SUBSTRATES
SURFACES
THIN FILMS
TIME-OF-FLIGHT METHOD
X-RAY PHOTOELECTRON SPECTROSCOPY