Cathodoluminescence degradation of Y{sub 2}SiO{sub 5}:Ce thin films
- Department of Physics, University of the Free State, P.O. Box 339, Bloemfontein ZA9300 (South Africa)
Cathodoluminescence (CL) intensity of cerium-doped yttrium silicate (Y{sub 2}SiO{sub 5}:Ce) phosphor thin films grown by pulsed laser deposition were investigated for possible application in low voltage field emission displays (FEDs). A thin layer of tin oxide (SnO{sub 2}) was ablated on some of the films in order to investigate the effect of the coated layer on the degradation of the CL intensity. Auger electron spectroscopy (AES) and CL spectroscopy were used to monitor changes in the surface chemical composition and luminous efficiency of the thin films. AES and CL spectroscopy were done with 2 keV energy electrons and with beam current densities of 26 and 52 mA cm{sup -2}. Measurements were done in high vacuum and in oxygen pressures of 1x10{sup -8}, 1x10{sup -7}, and 1x10{sup -6} Torr. Residual gas mass analysis showed that the adventitious carbon (C) was removed from the surface as volatile gas species, which is consistent with the electron stimulated surface chemical reaction model. The SnO{sub 2} coated thin films resulted in a lower but more stable CL intensity than the uncoated thin films. The degradation of the CL intensity was much less for the thin films after the same time period than for the Y{sub 2}SiO{sub 5}:Ce powders.
- OSTI ID:
- 20979481
- Journal Information:
- Journal of Vacuum Science and Technology. A, International Journal Devoted to Vacuum, Surfaces, and Films, Journal Name: Journal of Vacuum Science and Technology. A, International Journal Devoted to Vacuum, Surfaces, and Films Journal Issue: 4 Vol. 25; ISSN 1553-1813
- Country of Publication:
- United States
- Language:
- English
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Related Subjects
AUGER ELECTRON SPECTROSCOPY
BEAM CURRENTS
CARBON
CATHODOLUMINESCENCE
CERIUM
CHEMICAL COMPOSITION
CHEMICAL REACTIONS
CURRENT DENSITY
DOPED MATERIALS
ENERGY BEAM DEPOSITION
FIELD EMISSION
LASER RADIATION
OXYGEN
POWDERS
PULSED IRRADIATION
SURFACES
THIN FILMS
TIN OXIDES
YTTRIUM SILICATES