Dynamic scaling in ion etching of tungsten films

Journal Article · Mon Jul 30 00:00:00 EDT 2007 · Applied Physics Letters

DOI:https://doi.org/10.1063/1.2760157· OSTI ID:20972034

Peverini, Luca; Ziegler, Eric; Kozhevnikov, Igor ^[1]

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1. European Synchrotron Radiation Facility, BP 220, 38043 Grenoble Cedex (France)

Grazing incidence x-ray scattering is employed in situ and in real time to investigate quantitatively the time-dependent roughening of an ion bombarded tungsten layer. The evolution of surface morphology is analyzed in terms of power spectral density functions extracted directly from the measured scattering diagrams. In the [1x10{sup -4},4.6x10{sup -2}] nm{sup -1} spatial frequency range, roughness spectra for progressive thickness are shown to obey a universal scaling form leading to scaling exponents consistent with the prediction of the Kardar-Parisi-Zhang equation in 2+1 dimensions.

• OSTI ID: 20972034
• Journal Information: Applied Physics Letters, Journal Name: Applied Physics Letters Journal Issue: 5 Vol. 91; ISSN APPLAB; ISSN 0003-6951
• Country of Publication: United States
• Language: English

Related Subjects

36 MATERIALS SCIENCE
EQUATIONS
ETCHING
EVOLUTION
LAYERS
MORPHOLOGY
ROUGHNESS
SPECTRAL DENSITY
THICKNESS
THIN FILMS
THREE-DIMENSIONAL CALCULATIONS
TIME DEPENDENCE
TUNGSTEN
X-RAY DIFFRACTION