Room temperature deposited vanadium oxide thin films for uncooled infrared detectors
We demonstrate the room temperature deposition of vanadium oxide thin films by pulsed laser deposition (PLD) technique for application as the thermal sensing layer in uncooled infrared (IR) detectors. The films exhibit temperature coefficient of resistance (TCR) of 2.8%/K implies promising application in uncooled IR detectors. A 2-D array of 10-element test microbolometer is fabricated without thermal isolation structure. The IR response of the microbolometer is measured in the spectral range 8-13 {mu}m. The detectivity and the responsivity are determined as {approx}6x10{sup 5} cm Hz{sup 1/2}/W and 36 V/W, respectively, at 10 Hz of the chopper frequency with 50 {mu}A bias current for a thermal conductance G{approx}10-3 W/K between the thermal sensing layer and the substrate. By extrapolating with the data of a typical thermally isolated microbolometer (G{approx}10{sup -7} W/K), the projected responsivity is found to be around 10{sup 4} V/W, which well compares with the reported values.
- OSTI ID:
- 20887980
- Journal Information:
- Materials Research Bulletin, Vol. 38, Issue 7; Other Information: DOI: 10.1016/S0025-5408(03)00118-1; PII: S0025540803001181; Copyright (c) 2003 Elsevier Science B.V., Amsterdam, The Netherlands, All rights reserved; Country of input: International Atomic Energy Agency (IAEA); ISSN 0025-5408
- Country of Publication:
- United States
- Language:
- English
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