An effective route for the fabrication of rare earth-iron-boron thin films having strong c-axis texture and excellent hard magnetic properties
- Centre for Advanced Magnetic Materials and Devices, Department of Engineering Materials, University of Sheffield, Sheffield S1 3JD (United Kingdom) and National Laboratory of Solid State Microstructures, Department of Physics, Nanjing University, Nanjing, 210093 (China)
Rare-earth iron-boron (RE-Fe-B) thin films with a c-axis texture were prepared on a Ta (110) buffer layer on thermally oxidized Si substrates by dc magnetron sputtering. The microstructure, magnetic structure, and magnetic properties of these films were studied as a function of the deposition temperature. The results show that c-axis texture can be obtained over a wide range of deposition temperatures and that the degree of c-axis orientation improves with deposition temperature. It was established that deposition of a RE-Fe-B thin film to obtain grains with a strong c-axis RE{sub 2}Fe{sub 14}B texture, coexisting with an amorphous phase, followed by annealing at higher temperature, is an effective route for obtaining excellent hard magnetic properties. Initial results show that a film, which was deposited at 470 deg. C and annealed at 590 deg. C, had a high perpendicular coercivity of 1.8 T, in combination with a large maximum energy product of 238 kJ/m{sup 3}.
- OSTI ID:
- 20884969
- Journal Information:
- Journal of Applied Physics, Vol. 101, Issue 1; Other Information: DOI: 10.1063/1.2424539; (c) 2007 American Institute of Physics; Country of input: International Atomic Energy Agency (IAEA); ISSN 0021-8979
- Country of Publication:
- United States
- Language:
- English
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Related Subjects
AMORPHOUS STATE
ANNEALING
BORON ALLOYS
COERCIVE FORCE
CRYSTAL STRUCTURE
DEPOSITION
FABRICATION
IRON ALLOYS
MAGNETIC PROPERTIES
MICROSTRUCTURE
OXIDATION
PERMANENT MAGNETS
RARE EARTH ALLOYS
SILICON
SPUTTERING
TANTALUM
TEMPERATURE DEPENDENCE
TEMPERATURE RANGE 0400-1000 K
TEXTURE
THIN FILMS