Particle emission from tantalum plasma produced by 532 nm laser pulse ablation
- Dipartimento di Fisica, Universita di Messina, Contrada Papardo 31, 98100 Messina (Italy) and INFN-Laboratori Nazionali del Sud, Via S. Sofia 44, 95173 Catania (Italy)
A study of visible laser ablation of tantalum in vacuum by using 3 ns Nd:YAG laser radiation at high pulse energy is reported. Nanosecond pulsed ablation, at an intensity on the order of 10{sup 9} W/cm{sup 2}, produces high nonisotropic emission of neutrals and ionic species. Mass quadrupole spectrometry, coupled to electrostatic ion deflection, allows estimation of the energy distributions of the emitted species within the plume as a function of the incident laser energy. Neutrals show typical Boltzmann distributions while ions show Coulomb-Boltzmann-shifted distributions depending on their charge state. Surface profiles of the craters and microscopy investigations permitted to study the ablation threshold, ablation yields, and deposition rates of thin films on silicon substrates. The multicomponent structure of the plume emission is rationalized in terms of charge state, ion and neutral equivalent temperatures, and plasma density. A special regard is given to the ion acceleration process occurring inside the plasma due to the high electrical field generated at the nonequilibrium plasma conditions. The angular distributions of the neutral and ion species are also presented and discussed.
- OSTI ID:
- 20884797
- Journal Information:
- Journal of Applied Physics, Vol. 100, Issue 9; Other Information: DOI: 10.1063/1.2358400; (c) 2006 American Institute of Physics; Country of input: International Atomic Energy Agency (IAEA); ISSN 0021-8979
- Country of Publication:
- United States
- Language:
- English
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Related Subjects
ABLATION
ALUMINIUM OXIDES
ANGULAR DISTRIBUTION
CHARGE STATES
ELECTRON TEMPERATURE
ENERGY BEAM DEPOSITION
ENERGY SPECTRA
LASER RADIATION
LASERS
NON-EQUILIBRIUM PLASMA
PLASMA DENSITY
PLASMA DIAGNOSTICS
PLASMA PRODUCTION
PULSED IRRADIATION
PULSES
QUADRUPOLES
SILICON
TANTALUM
THIN FILMS
YTTRIUM COMPOUNDS