Characterization of oxide films on 4H-SiC epitaxial (0001) faces by high-energy-resolution photoemission spectroscopy: Comparison between wet and dry oxidation
- Department of Electrical and Electronic Systems Engineering, Saitama University, 255 Shimo-Okubo, Sakura-ku, Saitama-shi, Saitama 338-8570 (Japan)
Wet and dry oxide films-4H-SiC epitaxial (0001) C-face interfaces have been characterized by capacitance-voltage (C-V) measurements and soft x-ray excited photoemission spectroscopy (SX-PES) and hard x-ray excited photoemission spectroscopy (HX-PES) using synchrotron radiation. The interface state density for wet oxidation is much smaller than that for dry oxidation at any energy level. In the PES measurements, intermediate oxidation states such as Si{sup 1+} and Si{sup 3+} were observed. In addition, the areal densities of these states were found to be in a good correspondence with those of the interface states. The reasons for the good electrical characteristics of metal-oxide-semiconductor devices fabricated by wet oxidation are discussed in terms of the depth profiles of oxide films derived from the SX-PES and HX-PES results.
- OSTI ID:
- 20884700
- Journal Information:
- Journal of Applied Physics, Vol. 100, Issue 5; Other Information: DOI: 10.1063/1.2345471; (c) 2006 American Institute of Physics; Country of input: International Atomic Energy Agency (IAEA); ISSN 0021-8979
- Country of Publication:
- United States
- Language:
- English
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Related Subjects
CAPACITANCE
DIELECTRIC MATERIALS
ELECTRIC POTENTIAL
ENERGY RESOLUTION
EPITAXY
HARD X RADIATION
INTERFACES
LAYERS
OXIDATION
OXIDES
PHOTOEMISSION
SEMICONDUCTOR DEVICES
SEMICONDUCTOR MATERIALS
SILICON CARBIDES
SOFT X RADIATION
SYNCHROTRON RADIATION
THIN FILMS
X-RAY PHOTOELECTRON SPECTROSCOPY