Growth of RuO{sub 2} nanorods in reactive sputtering

Journal Article · Mon Aug 07 00:00:00 EDT 2006 · Applied Physics Letters

DOI:https://doi.org/10.1063/1.2269180· OSTI ID:20860676

Lin, Y -T; Chen, C -Y; Hsiung, C -P; Cheng, K -W; Gan, J -Y ^[1]

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1. Department of Materials Science and Engineering, National Tsing Hua University, Hsinchu City, Taiwan 30043 (China)

The synthesis of RuO{sub 2} nanorods with reactive sputtering was demonstrated in this work. The synthesis process is very much like the metal organic chemical vapor deposition, except that RuO{sub 3} generated with reactive sputtering under high oxygen-to-argon flow ratio (>5 SCCM/15 SCCM) (SCCM denotes cubic centimeter per minute at STP) and high substrate temperature (>300 deg. C) is used in place of the metal organic precursor. RuO{sub 2} nanorods tend to grow steadily with constant aspect ratio ({approx}27) and the field-emission characteristics appear very sensitive to their spatial distribution.

• OSTI ID: 20860676
• Journal Information: Applied Physics Letters, Vol. 89, Issue 6; Other Information: DOI: 10.1063/1.2269180; (c) 2006 American Institute of Physics; Country of input: International Atomic Energy Agency (IAEA); ISSN 0003-6951
• Country of Publication: United States
• Language: English

Related Subjects

36 MATERIALS SCIENCE
ARGON
ASPECT RATIO
CHEMICAL VAPOR DEPOSITION
CRYSTAL GROWTH
FIELD EMISSION
NANOSTRUCTURES
OXYGEN
RUTHENIUM OXIDES
SPATIAL DISTRIBUTION
SPUTTERING
SUBSTRATES