Optical Actionometry Of Cathode Material Sputtered Into Plasma Phase Of Glow Discharges

Journal Article · Sun Jan 15 04:00:00 EST 2006 · AIP Conference Proceedings

DOI:https://doi.org/10.1063/1.2168859· OSTI ID:20797933

Wronski, Zdzislaw ^[1]

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1. Institute of Physics, UMCS, 20-031 Lublin (Poland)

Cathode sputtering by glow discharge plasma is the effective solid etching. The emission of optical lines by plasma is a complex process depending on gas used. The peculiar processes such fast ion-sputte-red atom interaction and Penning excitation have been found to contribute much to the emission of optical lines of sputtered species. The optical actionometry of sputtered atoms is not suggested to be a useful method because of a lack of proper cross sections of the above peculiar processes. At present the computer simulation of both etching and characteristics of sputtered atoms in the plasma phase seems to be the preferential method.

• OSTI ID: 20797933
• Journal Information: AIP Conference Proceedings, Journal Name: AIP Conference Proceedings Journal Issue: 1 Vol. 812; ISSN APCPCS; ISSN 0094-243X
• Country of Publication: United States
• Language: English

Related Subjects

70 PLASMA PHYSICS AND FUSION TECHNOLOGY
ATOMS
CATHODE SPUTTERING
CATHODES
COMPUTERIZED SIMULATION
CROSS SECTIONS
EMISSION
ETCHING
EXCITATION
GLOW DISCHARGES
IONS
PLASMA
PLASMA DIAGNOSTICS
SPECTROSCOPY