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Title: Conduction noise attenuation by Fe{sub 3}O{sub 4} thin films attached on microstrip line

Journal Article · · Journal of Applied Physics
DOI:https://doi.org/10.1063/1.2177135· OSTI ID:20788143
; ;  [1]
  1. Department of Materials Engineering, Research Institute for Computer and Information Communication, Chungbuk National University, Heungduk-ku, Gaesin-dong 12, Cheongju 361-763 (Korea, Republic of)

Fe{sub 3}O{sub 4} thin films are prepared by reactive sputtering and their magnetic, electric, and noise absorbing properties are investigated with the aim of thin film noise absorbers in gigahertz frequencies. Fe{sub 3}O{sub 4} thin films were deposited on the glass substrate by reactive sputtering. It is found that the precise control of the oxygen partial pressure is the most critical to obtain the single-phase Fe{sub 3}O{sub 4} thin film. The vibrating sample magnetometer measurement indicates that the saturation magnetization is 400 emu/cm{sup 3} and the coercive force is about 200 Oe. A microstrip line (with a characteristic impedance of 50 {omega}) was used for the measurement of noise attenuation. Attaching the thin film on the microstrip line, the S{sub 11} parameter is increased from -60 dB (without a film) to about -15 dB (with a film). The S{sub 21} parameter is reduced to about -3 dB (about 50% in power) in the frequency range of 1-6 GHz, which is due to the magnetic loss of the Fe{sub 3}O{sub 4} films. Power absorption (defined by the ratio of power loss to input power) increases with frequency and saturates to maximum value (about 0.5) in the frequency region of 4-6 GHz. It can thus be suggested that the Fe{sub 3}O{sub 4} thin film is one of the high potential materials for noise suppressors in gigahertz frequencies.

OSTI ID:
20788143
Journal Information:
Journal of Applied Physics, Vol. 99, Issue 8; Conference: 50. annual conference on magnetism and magnetic materials, San Jose, CA (United States), 30 Oct - 3 Nov 2005; Other Information: DOI: 10.1063/1.2177135; (c) 2006 American Institute of Physics; Country of input: International Atomic Energy Agency (IAEA); ISSN 0021-8979
Country of Publication:
United States
Language:
English