Intrinsic anomalous surface roughening of TiN films deposited by reactive sputtering
- Instituto de Ciencia de Materiales de Madrid-CSIC, C-Sor Juana Ines de la Cruz 3, E-28049 Cantoblanco, Madrid (Spain)
- Departamento de Matematicas y Grupo Interdisciplinar de Sistemas Complejos, Universidad Carlos III de Madrid, Avenida de la Universidad 30, E-28911, Leganes, Madrid (Spain)
- Grupo Interdisciplinar de Sistemas Complejos y Grupo de Dinamica No Lineal, Escuela Tecnica Superior de Ingenieria (ICAI), Universidad Pontificia Comillas de Madrid, E-28015, Madrid (Spain)
- Institute of Physics, Slovak Academy of Sciences, Dubravska cesta 9, 845 11 Bratislava 45 (Slovakia)
We study surface kinetic roughening of TiN films grown on Si(100) substrates by dc reactive sputtering. The surface morphology of films deposited for different growth times under the same experimental conditions were analyzed by atomic force microscopy. The TiN films exhibit intrinsic anomalous scaling and multiscaling. The film kinetic roughening is characterized by a set of local exponent values {alpha}{sub loc}=1.0 and {beta}{sub loc}=0.39, and global exponent values {alpha}=1.7 and {beta}=0.67, with a coarsening exponent of 1/z=0.39. These properties are correlated to the local height-difference distribution function obeying power-law statistics. We associate this intrinsic anomalous scaling with the instability due to nonlocal shadowing effects that take place during thin-film growth by sputtering.
- OSTI ID:
- 20787858
- Journal Information:
- Physical Review. B, Condensed Matter and Materials Physics, Vol. 73, Issue 4; Other Information: DOI: 10.1103/PhysRevB.73.045436; (c) 2006 The American Physical Society; Country of input: International Atomic Energy Agency (IAEA); ISSN 1098-0121
- Country of Publication:
- United States
- Language:
- English
Similar Records
Unstable kinetic roughening during the island coalescence stage of sputtered tantalum films
Scaling of surface roughness in sputter-deposited ZnO:Al thin films