Laser-induced Ni(Ti) silicide formation

Journal Article · Mon Mar 13 00:00:00 EST 2006 · Applied Physics Letters

DOI:https://doi.org/10.1063/1.2186073· OSTI ID:20778823

Setiawan, Y; Lee, P S; Pey, K L; Wang, X C; Lim, G C ^[1]

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1. School of Materials Science and Engineering, Nanyang Technological University, 50 Nanyang Avenue, Singapore 639798 (Singapore) and Chartered Semiconductor Manufacturing Ltd., 60 Woodlands Industrial Park D, Street 2, Singapore 738406 (Singapore)

Effects of Ti alloying during laser-induced Ni silicide formation is studied. Unique triple layer microstructures were found with the presence of supercell in the NiSi{sub 2} grains formed at the interface. This supercell formation was caused by a local ordering of Ni and Si atoms that favor lower free energy during rapid solidification. Ti rapidly segregates from the alloy melt and forms a protective TiO{sub x} overlayer on the surface during solidification. Melt front progressing towards the Ni-rich region leads to quenching of an amorphous layer sandwiched between NiSi{sub 2} grains and the TiO{sub x} overlayer.

• OSTI ID: 20778823
• Journal Information: Applied Physics Letters, Vol. 88, Issue 11; Other Information: DOI: 10.1063/1.2186073; (c) 2006 American Institute of Physics; Country of input: International Atomic Energy Agency (IAEA); ISSN 0003-6951
• Country of Publication: United States
• Language: English

Related Subjects

36 MATERIALS SCIENCE
ANNEALING
FREE ENERGY
INTERFACES
LASERS
LAYERS
MICROSTRUCTURE
NICKEL ALLOYS
NICKEL SILICIDES
SILICON ALLOYS
SOLIDIFICATION
TITANIUM ALLOYS