Two-dimensional nanotriangle and nanoring arrays on silicon wafer

Journal Article · Mon Jan 30 04:00:00 EST 2006 · Applied Physics Letters

DOI:https://doi.org/10.1063/1.2168938· OSTI ID:20778666

Dongdong, Jia; Goonewardene, Anura ^[1]

---

1. Department of Geology and Physics, Lock Haven University of Pennsylvania, Lock Haven, Pennsylvania 17745 (United States)

Gold and tungsten were deposited on silicon wafer and/or glass substrates by using random incidence sputtering deposition and thermal vapor deposition techniques. Two-dimensional tungsten nanotriangle and gold nanoring arrays were obtained on the silicon wafer substrate and examined using scanning electron microscope and atomic force microscope analysis. The size of the equal tungsten nanotriangles is within 100 nm per side and 210 nm apart from each other. The size of gold nanorings is 220 nm diameter, 40 nm wide, 10 nm thick, and 560 nm apart from each other. No nanorings were found on the glass substrate. Mechanisms for the formation of nanoring arrays are discussed.

• OSTI ID: 20778666
• Journal Information: Applied Physics Letters, Journal Name: Applied Physics Letters Journal Issue: 5 Vol. 88; ISSN APPLAB; ISSN 0003-6951
• Country of Publication: United States
• Language: English

Related Subjects

36 MATERIALS SCIENCE
ATOMIC FORCE MICROSCOPY
DEPOSITION
GLASS
GOLD
NANOSTRUCTURES
RANDOMNESS
SCANNING ELECTRON MICROSCOPY
SILICON
SPUTTERING
SUBSTRATES
TUNGSTEN
TWO-DIMENSIONAL CALCULATIONS
VAPOR DEPOSITED COATINGS