Application of the shaped electrode technique to a large area rectangular capacitively coupled plasma reactor to suppress standing wave nonuniformity
- Ecole Polytechnique Federale de Lausanne (EPFL), Centre de Recherches en Physique des Plasmas, CH-1015 Lausanne (Switzerland)
The electromagnetic standing wave effect can become the main source of nonuniformity limiting the use of very high frequency in large area reactors exceeding 1 m{sup 2} required for industrial applications. Recently, it has been proposed and shown experimentally in a cylindrical reactor that a shaped electrode in place of the conventional flat electrode can be used in order to suppress the electromagnetic standing wave nonuniformity. In this study, we show experimental measurements demonstrating that the shaped electrode technique can also be applied in large area rectangular reactors. We also present results of electromagnetic screening by a conducting substrate which has important consequences for industrial application of the shaped electrode technique.
- OSTI ID:
- 20777331
- Journal Information:
- Journal of Vacuum Science and Technology. A, International Journal Devoted to Vacuum, Surfaces, and Films, Vol. 24, Issue 4; Other Information: DOI: 10.1116/1.2189266; (c) 2006 American Vacuum Society; Country of input: International Atomic Energy Agency (IAEA); ISSN 1553-1813
- Country of Publication:
- United States
- Language:
- English
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