Microfabricated Quadrupole Ion Trap for Mass Spectrometer Applications

Journal Article · Fri Mar 31 00:00:00 EST 2006 · Physical Review Letters

DOI:https://doi.org/10.1103/PhysRevLett.96.120801· OSTI ID:20777112

Pau, S ^[1]; Pai, C S; Low, Y L ^[2]; Moxom, J; Reilly, P T.A.; Whitten, W B ^[3]; Ramsey, J M ^[4]

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1. University of Arizona, Tucson, Arizona 85721 (United States)
2. Lucent Technologies, Bell Laboratories, Murray Hill, New Jersey 07974 (United States)
3. Oak Ridge National Laboratory, Oak Ridge, Tennessee 37831 (United States)
4. University of North Carolina, Chapel Hill, North Carolina 27599 (United States)

An array of miniaturized cylindrical quadrupole ion traps, with a radius of 20 {mu}m, is fabricated using silicon micromachining using phosphorus doped polysilicon and silicon dioxide for the purpose of creating a mass spectrometer on a chip. We have operated the array for mass-selective ion ejection and mass analysis using Xe ions at a pressure of 10{sup -4} Torr. The scaling rules for the ion trap in relation to operating pressure, voltage, and frequency are examined.

• OSTI ID: 20777112
• Journal Information: Physical Review Letters, Vol. 96, Issue 12; Other Information: DOI: 10.1103/PhysRevLett.96.120801; (c) 2006 The American Physical Society; Country of input: International Atomic Energy Agency (IAEA); ISSN 0031-9007
• Country of Publication: United States
• Language: English

Related Subjects

71 CLASSICAL AND QUANTUM MECHANICS
GENERAL PHYSICS
37 INORGANIC
ORGANIC
PHYSICAL AND ANALYTICAL CHEMISTRY
CHEMICAL ANALYSIS
CYLINDRICAL CONFIGURATION
DOPED MATERIALS
MACHINING
MASS SPECTROMETERS
MICROSTRUCTURE
PHOSPHORUS
PRESSURE RANGE MILLI PA
QUADRUPOLES
SILICON
SILICON OXIDES
TRAPS
XENON IONS