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Title: Sensitive elemental analysis by ArF laser-induced fluorescence of laser ablation plumes: Elucidation of the fluorescence mechanism

Journal Article · · Applied Physics Letters
DOI:https://doi.org/10.1063/1.2149983· OSTI ID:20776935
;  [1]
  1. Department of Physics, Hong Kong Baptist University, Kowloon Tong, Hong Kong (China) and Faculty of Science and Technology, University of Macau, Macau (China)

Numerous atomic analytes in plumes produced by pulsed-laser ablation fluoresced upon ArF laser irradiation. The likely mechanism was photoexcitation to levels near the ionization limit. These levels were dense and were probably broadened by the extreme plume density to allow efficient absorption of 193 nm photons. The excited atoms relaxed to intermediate states as the plume expanded. Interparticle interaction weakened and transitions from these states produced sharp spectral lines for elemental analysis. This ArF-induced fluorescence technique was orders of magnitude more sensitive than laser-induced plasma spectroscopy.

OSTI ID:
20776935
Journal Information:
Applied Physics Letters, Vol. 87, Issue 26; Other Information: DOI: 10.1063/1.2149983; (c) 2005 American Institute of Physics; Country of input: International Atomic Energy Agency (IAEA); ISSN 0003-6951
Country of Publication:
United States
Language:
English