Control of negative ion density in SF{sub 6}/Ar capacitive discharges
- Department of Physics, Korea Advanced Institute of Science and Technology, Daejeon 305-701 (Korea, Republic of)
A method to control negative ion density in SF{sub 6}/Ar capacitive discharges with a biased grid is proposed. It is observed that the negative ion density and its ratio to positive ion density are variable in a wide range from 2.8x10{sup 7} to 4x10{sup 9} cm{sup -3} and from 0.18 to 0.86, respectively, depending on the grid bias voltage. To investigate the effect of grid bias on negative ion generation, electron energy distribution functions (EEDFs) are measured and rate constants for electron attachment reactions are calculated at various bias voltages. Results are shown that the attachment processes are predominantly governed by the fraction of low energy electrons in the EEDF, which is controllable using the grid bias.
- OSTI ID:
- 20764486
- Journal Information:
- Physics of Plasmas, Journal Name: Physics of Plasmas Journal Issue: 8 Vol. 12; ISSN PHPAEN; ISSN 1070-664X
- Country of Publication:
- United States
- Language:
- English
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