On the origin of laser-induced surface activation of ceramics
- Tennessee Univ., Knoxville, TN (United States)
- Oak Ridge National Lab., TN (United States)
- Oak Ridge Y-12 Plant, TN (United States)
Pulsed-laser irradiation of Al{sub 2}O{sub 3} and AlN surfaces promotes Cu deposition when the irradiated substgrates are immersed in an electroless bath. In this paper, the nature of the surface modification is analyzed using Auger emission spectroscopy (AES) and cross sectional transmission electron microscopy. During irradiation, AlN thermaly decomposes, leaving a discontinuous metallic film on the surface. A film of Al{sub 2}O{sub 3} is detected at the surface of the irradiated AlN substrate, much thicker when the irradiation is done in an oxidizing atmosphere than in a reducing one. Nanoparticles of metallic Al are generated during laser irradiation of Al{sub 2}O{sub 3} in a reducing atmosphere. When the Al{sub 2}O{sub 3} irradiation is done in an oxidizing atmosphere, regions containing Al or substoichiometric alumina are detected by AES. It is concluded that the presence of metallic Al is the main reason why electroless deposition can occur in both AlN and Al{sub 2}O{sub 3}. Deposition kinetics are consistent with this conclusion. It is likely that also substoichiometric alumina helps to catalyze the electroless deposition.
- Research Organization:
- Oak Ridge National Lab., TN (United States)
- Sponsoring Organization:
- National Science Foundation, Washington, DC (United States); USDOE, Washington, DC (United States)
- DOE Contract Number:
- AC05-96OR22464
- OSTI ID:
- 207608
- Report Number(s):
- CONF-951155--91; ON: DE96006721; CNN: Grant DMR-9116528
- Country of Publication:
- United States
- Language:
- English
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