Efficient sub 100 nm focusing of hard x rays
- European Synchrotron Radiation Facility (ESRF), BP220 38240, Grenoble (France)
An x-ray beam with energy of 20.5 keV has been efficiently focused down to a spot size as small as 90 nmx90 nm by a Kirkpatrick-Baez reflecting mirrors device. The first mirror, coated with a graded multilayer, plays both the role of vertical focusing device and monochromator, resulting in a very high flux (2x10{sup 11} photons/s) and medium monochromaticity ({delta}E/E{approx}10{sup -2}). Evaluation of the error contributions shows that the vertical focus is presently limited by the mirror figure errors, while the horizontal focus is limited by the horizontal extension of the x-ray source. With a gain in excess of a few million, this device opens up new possibilities in trace element nanoanalysis and fast projection microscopy.
- OSTI ID:
- 20722907
- Journal Information:
- Review of Scientific Instruments, Journal Name: Review of Scientific Instruments Journal Issue: 6 Vol. 76; ISSN 0034-6748; ISSN RSINAK
- Country of Publication:
- United States
- Language:
- English
Similar Records
HYBRID simulations of diffraction-limited focusing with Kirkpatrick-Baez mirrors for a next-generation In Situ hard X-ray nanoprobe
Diffraction-limited two-dimensional hard-x-ray focusing at the 100 nm level using a Kirkpatrick-Baez mirror arrangement