Atom nanolithography with multilayer light masks: Particle optics analysis

Journal Article · Mon Aug 15 00:00:00 EDT 2005 · Physical Review. A

DOI:https://doi.org/10.1103/PhysRevA.72.023417· OSTI ID:20718173

Arun, R; Averbukh, I Sh ^[1]; Pfau, T ^[2]

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1. Department of Chemical Physics, The Weizmann Institute of Science, Rehovot (Israel)
2. 5th Institute of Physics, University of Stuttgart (Germany)

We studied the focusing of atoms by multiple layers of standing light waves in the context of atom lithography. In particular, atomic localization by a double-layer light mask is examined using the optimal squeezing approach. Operation of the focusing setup is analyzed both in the paraxial approximation and in the regime of nonlinear spatial squeezing for the thin-thin, as well as thin-thick, atom lens combinations. It is shown that the optimized double light mask may considerably reduce the imaging problems, improve the quality of focusing, and enhance the contrast ratio of the deposited structures.

• OSTI ID: 20718173
• Journal Information: Physical Review. A, Vol. 72, Issue 2; Other Information: DOI: 10.1103/PhysRevA.72.023417; (c) 2005 The American Physical Society; Country of input: International Atomic Energy Agency (IAEA); ISSN 1050-2947
• Country of Publication: United States
• Language: English

Related Subjects

74 ATOMIC AND MOLECULAR PHYSICS
ATOMS
LAYERS
MASKING
NONLINEAR PROBLEMS
OPTICS
PHOTON-ATOM COLLISIONS
VISIBLE RADIATION