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Magnetic properties and microstructures of Fe-Pt thin films sputter deposited under partial nitrogen gas flow

Journal Article · · Journal of Applied Physics
DOI:https://doi.org/10.1063/1.1943509· OSTI ID:20713962
; ;  [1]
  1. National Institute for Materials Science, Tsukuba 305-0047 (Japan)

Continuous Fe{sub 100-x}Pt{sub x} thin films (x=44, 50, 56, 60, and 65) with a thickness of around 80 nm were prepared by dc magnetron sputtering under a mixture of argon and nitrogen gases. The maximum coercivity was obtained at the Fe{sub 56}Pt{sub 44} off-stoichiometric composition after postannealing for L1{sub 0} ordering. For the equiatomic and Pt-rich films, partial nitrogen flow during sputtering deteriorated the in-plane coercivity of the postannealed samples due to conglomeration of smaller grains and the presence of L1{sub 2}FePt{sub 3} phase. After postannealing for L1{sub 0} ordering, the Fe-rich films grown in argon and mixture of argon and nitrogen atmospheres are both composed of L1{sub 0} fct phase only, and the enhancement of the degree of order and strong preferential in-plane alignment of the c axis in the presence of nitrogen causes in-plane coercivity increase. By introducing nitrogen during sputtering, an in-plane coercivity of 1303 kA/m (16.4 kOe) was obtained for the continuous Fe{sub 56}Pt{sub 44} thin film annealed at 700 deg. C.

OSTI ID:
20713962
Journal Information:
Journal of Applied Physics, Journal Name: Journal of Applied Physics Journal Issue: 1 Vol. 98; ISSN JAPIAU; ISSN 0021-8979
Country of Publication:
United States
Language:
English