Distribution of defects induced in fused silica by ultraviolet laser pulses before and after treatment with a CO{sub 2} laser
- School of Physics, University of New South Wales, Sydney, New South Wales 2052 (Australia)
The depth distribution of ultraviolet laser irradiation-induced defects in fused silica has been determined using cathodoluminescence (CL) microanalysis. CL emissions have been observed at 1.9, 2.2, 2.7, and 4.4 eV. In addition, following a CO{sub 2} laser treatment for damage mitigation, an emission at 3.2 eV is also observed. The CL emissions have been identified with the nonbridging oxygen hole center, the self-trapped exciton, the oxygen-deficient center, and the aluminum impurity center. The spatially resolved CL data are consistent with the damage initiation at the exit surface. The concentration of 355-nm laser-induced defects is greatest at the surface and monotonically decays to preirradiation levels at {approx}10-{mu}m depth below the surface. The CO{sub 2} processing reduces the defect concentration and spatial distribution to a maximum depth of {approx}6 {mu}m, confirming significant damage mitigation.
- OSTI ID:
- 20711714
- Journal Information:
- Journal of Applied Physics, Vol. 97, Issue 11; Other Information: DOI: 10.1063/1.1922591; (c) 2005 American Institute of Physics; Country of input: International Atomic Energy Agency (IAEA); ISSN 0021-8979
- Country of Publication:
- United States
- Language:
- English
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