Effect of low numerical-aperture femtosecond two-photon absorption on (SU-8) resist for ultrahigh-aspect-ratio microstereolithography
- IBM Research, Zuerich Research Laboratory, 8803 Rueschlikon, Switzerland and Cavendish Laboratory, University of Cambridge, Madingley Road, Cambridge CB3 0HE (United Kingdom)
We report the quantitative characterization and analysis on the solidification of SU-8, a chemically amplified near-ultraviolet ultrathick resist, based on two-photon-absorbed (TPA) near-infrared photopolymerization. The resolution of TPA photopolymerized SU-8 voxels and lines is studied as a function of laser-pulse energy, single-shot exposure time, and scanning speed. Two-photon microstereolithography using SU-8 as the matrix material was verified by the fabrication of SU-8 photoplastic structures with subdiffraction-limit resolution. We show that the nonlinear velocity dependence of TPA photopolymerization can be used as the shutter mechanism for disruptive three-dimensional (3D) lithography. This mechanism, when combined with low numerical-aperture optics is exploited for the rapid 3D microfabrication of ultrahigh-aspect-ratio (up to 50:1) photoplastic pillars, planes, and cage structures.
- OSTI ID:
- 20668233
- Journal Information:
- Journal of Applied Physics, Vol. 97, Issue 5; Other Information: DOI: 10.1063/1.1856214; (c) 2005 American Institute of Physics; Country of input: International Atomic Energy Agency (IAEA); ISSN 0021-8979
- Country of Publication:
- United States
- Language:
- English
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