Exchange bias in NiFe/FeMn/NiFe trilayers

Journal Article · Wed Dec 15 04:00:00 EST 2004 · Journal of Applied Physics

DOI:https://doi.org/10.1063/1.1815048· OSTI ID:20662228

Sankaranarayanan, V K; Yoon, S M; Kim, D Y; Kim, C O; Kim, C G ^[1]

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1. Research Center for Advanced Magnetic Materials, Chungnam National University, Daejon 305-764 (Korea, Republic of)

NiFe/FeMn/NiFe trilayer structure forms an integral part of many conventional and tunneling magnetoresistance spin valve structures with FeMn antiferromagnetic layer. A systematic investigation of the exchange bias variations of the seed and top pinned NiFe layers in the NiFe/FeMn/NiFe trilayer structure is reported as a function of thickness of all the three constituting layers, in multilayers prepared by rf magnetron sputtering. X-ray diffraction patterns show the (111) texture for the NiFe and FeMn layers, necessary for the development of antiferromagnetic {gamma}-fcc phase. In thickness variation studies of all the three magnetic layers, seed NiFe layer shows greater bias (150 Oe) than the top pinned NiFe layer (80 Oe only). The exchange bias shows the expected 1/t behavior for increasing NiFe layer thickness after initial maxima at low thickness. In the FeMn antiferromagnet layer thickness variation on the other hand, the large bias values attained around 5 nm thickness is nearly retained up to a thickness of 25 nm and the bias for the top NiFe layer is again substantially lower. The greater bias observed for the seed NiFe layer in all the three thickness variation studies is attributed to its growth over a saturated (111) oriented NiFe seed layer, which induces formation of interfacial FeMn layers with a net parallel spin ordering, in presence of the constant applied field. On the other hand, at the top FeMn/NiFe surface, the rigid FeMn surface with compensated bulk spin ordering formed already, is not easily biased and reoriented along the top NiFe layer, to develop as much parallel net spins in the antiferromagnetic material, and hence lower bias.

• OSTI ID: 20662228
• Journal Information: Journal of Applied Physics, Journal Name: Journal of Applied Physics Journal Issue: 12 Vol. 96; ISSN JAPIAU; ISSN 0021-8979
• Country of Publication: United States
• Language: English

Related Subjects

36 MATERIALS SCIENCE
ANTIFERROMAGNETIC MATERIALS
ANTIFERROMAGNETISM
BINARY ALLOY SYSTEMS
DEPOSITION
ELECTRONS
EXCHANGE INTERACTIONS
FCC LATTICES
FERROMAGNETIC MATERIALS
HYSTERESIS
IRON ALLOYS
LAYERS
MAGNETORESISTANCE
MANGANESE ALLOYS
NICKEL ALLOYS
SPIN
SPUTTERING
THICKNESS
THIN FILMS
TUNNEL EFFECT
X-RAY DIFFRACTION