Development of a Linear Stitching Interferometric System for Evaluation of Very Large X-ray Synchrotron Radiation Substrates and Mirrors

Journal Article · Wed May 12 00:00:00 EDT 2004 · AIP Conference Proceedings

DOI:https://doi.org/10.1063/1.1757929· OSTI ID:20653086

Assoufid, Lahsen; Deming, Shu ^[1]; Bray, Michael ^[2]

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1. Argonne National Laboratory, 9700 South Cass Avenue Argonne, Illinois 60439 (United States)
2. MB-Optique SARL, 26-ter, rue Nicolai, 75012 Paris (France)

Stitching interferometry, using small-aperture, high-resolution, phase-measuring interferometric systems has been investigated for quite some time now as a metrology technique to obtain surface profiles of oversized optical components and substrates. The technique offers the potential for providing 3D measurements of mirror surfaces with nanometer resolution. The aim of this work is to apply this technique to the specific case of large, flat, grazing-incidence x-ray mirrors, such as those used in beamlines at synchrotron radiation facilities around the world. In the case of x-ray mirrors, obtaining a 3D surface profile can be particularly useful in many instances, for example, in selecting the best reflecting stripe on a mirror surface to be used for undulator beams. The measurement data can be used for simulating and predicting mirror performance under realistic conditions, etc. A fully automated stitching system is currently being developed at the metrology laboratory of the Advanced Photon Source at Argonne National Laboratory. Preliminary tests performed on a 460-mm-long flat float-glass substrate and on a 300-mm-long superpolished silicon substrate, were encouraging. The stitched profiles showed no obvious overlap errors, and the results agree well with those obtained using other techniques.

• OSTI ID: 20653086
• Journal Information: AIP Conference Proceedings, Vol. 705, Issue 1; Conference: 8. international conference on synchrotron radiation instrumentation, San Francisco, CA (United States), 25-29 Aug 2003; Other Information: DOI: 10.1063/1.1757929; (c) 2004 American Institute of Physics; Country of input: International Atomic Energy Agency (IAEA); ISSN 0094-243X
• Country of Publication: United States
• Language: English

Related Subjects

46 INSTRUMENTATION RELATED TO NUCLEAR SCIENCE AND TECHNOLOGY
ADVANCED PHOTON SOURCE
ANL
APERTURES
BEAM OPTICS
ERRORS
EVALUATION
GLASS
GRAZING INCIDENCE TOMOGRAPHY
INTERFEROMETRY
MEASURING METHODS
MIRRORS
PERFORMANCE
RESOLUTION
SILICON
SUBSTRATES
SURFACES
SYNCHROTRON RADIATION
TOPOGRAPHY
WIGGLER MAGNETS
X RADIATION