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Title: Refractive lenses fabricated by deep SR lithography and LIGA technology for X-ray energies from 1 keV to 1 MeV

Journal Article · · AIP Conference Proceedings
DOI:https://doi.org/10.1063/1.1757905· OSTI ID:20653060
; ; ; ;  [1]; ; ; ;  [2];  [3];  [4]
  1. Institut fuer Mikrostrukturtechnik/Forschungszentrum Karlsruhe GmbH, 76021 Karlsruhe (Germany)
  2. ESRF, BP-220, Grenoble Cedex (France)
  3. Institut fuer Synchrotron Strahlung/Forschungszentrum Karlsruhe GmbH, 76021 Karlsruhe (Germany)
  4. IMT RAS, Chernogolovka, 142432 (Russian Federation)

SU-8 polymer and Nickel were used to manufacture planar high aspect ratio X-ray refractive lenses by the LIGA process (Deep X-ray lithography, electroforming). The exposure of PMMA and highly sensitive SU-8 resist layers were carried out at the ANKA storage ring, Karlsruhe. Lenses of either round, segment or quasi-parabolic (kinoform) profiles have been designed, fabricated and tested at the ESRF and at the ANKA synchrotron sources with X-ray energies ranging from 12 to 55 keV. The SU-8 polymer lenses tested at ESRF showed an uniform focal line spot with FWHM of appr. 0.32 {mu}m and gains in the range of 320. The characteristics did not alter after an absorbed dose of 2 MJ/cm3. Lenses fabricated from electroplated Ni, 320 {mu}m thick, were tested at a photon energy of 212 keV. In this case the uniform focal line spot was about 5 {mu}m.

OSTI ID:
20653060
Journal Information:
AIP Conference Proceedings, Vol. 705, Issue 1; Conference: 8. international conference on synchrotron radiation instrumentation, San Francisco, CA (United States), 25-29 Aug 2003; Other Information: DOI: 10.1063/1.1757905; (c) 2004 American Institute of Physics; Country of input: International Atomic Energy Agency (IAEA); ISSN 0094-243X
Country of Publication:
United States
Language:
English

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