Performance Characteristics of Beamline 6.3.1 from 200 eV to 2000 eV at the Advanced Light Source

Journal Article · Wed May 12 04:00:00 EDT 2004 · AIP Conference Proceedings

DOI:https://doi.org/10.1063/1.1757832· OSTI ID:20652979

Nachimuthu, P ^[1]; Underwood, J H; Kemp, C D; Gullikson, E M; Shuh, D K; Perera, R C.C. ^[1]; Lindle, D W ^[2]

---

1. Lawrence Berkeley National Laboratory, Berkeley, CA 94720 (United States)
2. Department of Chemistry, University of Nevada, Las Vegas, NV 89154 (United States)

Bend magnet beamline 6.3.1 at the Advanced Light Source operates from 200 eV to 2000 eV, primarily used for x-ray absorption fine structure investigations. The beamline optics consist of a compact, entrance-slitless, Hettrick-Underwood type variable-line-spacing plane-grating monochromator and refocusing mirrors to provide a 25 {mu}m x 500 {mu}m spot at the focal point in the reflectometer end station. Wavelength is scanned by the simple rotation of the grating and illuminates a fixed exit slit. The LabView based beamline control and data acquisition computer code has been implemented to provide a convenient interface to the user. The dedicated end station is a reflectometer that is isolated from the beamline by a differential ion pump. The reflectometer can position samples to within 4 {mu}m with an angular position of 0.002 deg., has total electron and fluorescence yield detectors, and pumps down in about 30 minutes. External end stations can be mounted downstream of the reflectometer as well. The versatility and simplicity of beamline 6.3.1 have made it useful for a wide range of applications such as the characterization of optical components, reflective coatings, and the investigation of a diverse range of materials in both the solid state and in solution.

• OSTI ID: 20652979
• Journal Information: AIP Conference Proceedings, Journal Name: AIP Conference Proceedings Journal Issue: 1 Vol. 705; ISSN APCPCS; ISSN 0094-243X
• Country of Publication: United States
• Language: English

Related Subjects

43 PARTICLE ACCELERATORS
ABSORPTION
ADVANCED LIGHT SOURCE
BEAM OPTICS
COMPUTER CODES
DATA ACQUISITION
ELECTRON BEAMS
ELECTRONS
EV RANGE 100-1000
FINE STRUCTURE
FLUORESCENCE
KEV RANGE 01-10
MAGNETS
PERFORMANCE
REFLECTIVE COATINGS
SOLUTIONS
SYNCHROTRON RADIATION
SYNCHROTRONS
X RADIATION
X-RAY SPECTRA