Self-consistent Lagrangian study of nonlinear Landau damping
Journal Article
·
· Physical Review. E, Statistical Physics, Plasmas, Fluids, and Related Interdisciplinary Topics
- Dipartimento di Fisica and Istituto Nazionale di Fisica della Materia, Unita di Cosenza, Universita della Calabria, I-87030 Arcavacata di Rende (Italy)
The electric field computed by numerically solving the one-dimensional Vlasov-Poisson system is used to calculate Lagrangian trajectories of particles in the wave-particle resonance region. The analysis of these trajectories shows that, when the initial amplitude of the electric field is above some threshold, two populations of particles are present: a first one located near the separatrix, which performs flights in the phase space and whose trajectories become ergodic and chaotic, and a second population of trapped particles, which displays a nonergodic dynamics. The complex, nonlinear interaction between these populations determines the oscillating long-time behavior of solutions.
- OSTI ID:
- 20641371
- Journal Information:
- Physical Review. E, Statistical Physics, Plasmas, Fluids, and Related Interdisciplinary Topics, Journal Name: Physical Review. E, Statistical Physics, Plasmas, Fluids, and Related Interdisciplinary Topics Journal Issue: 1 Vol. 71; ISSN PLEEE8; ISSN 1063-651X
- Country of Publication:
- United States
- Language:
- English
Similar Records
Nonlinear Landau damping in nonextensive statistics
Magnetic-field effects on nonlinear electrostatic-wave Landau damping
Trapped particle effects in long-time nonlinear Landau damping
Journal Article
·
Fri Jul 15 00:00:00 EDT 2005
· Physics of Plasmas
·
OSTI ID:20764370
Magnetic-field effects on nonlinear electrostatic-wave Landau damping
Journal Article
·
Fri Dec 31 23:00:00 EST 2004
· Physical Review. E, Statistical Physics, Plasmas, Fluids, and Related Interdisciplinary Topics
·
OSTI ID:20641351
Trapped particle effects in long-time nonlinear Landau damping
Journal Article
·
Mon Aug 15 00:00:00 EDT 2011
· Physics of Plasmas
·
OSTI ID:22043376