Pulsed dc operation of a Penning-type opposed target magnetron

Journal Article · Sat Jan 01 04:00:00 EST 2005 · Journal of Vacuum Science and Technology. A, Vacuum, Surfaces and Films

DOI:https://doi.org/10.1116/1.1828086· OSTI ID:20636958

Moiseev, T; Cameron, D C ^[1]

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1. National Centre for Plasma Science and Technology, Dublin City University, Dublin 9 (Ireland)

This article describes the medium frequency pulsed dc power operation of a Penning-type (opposed target) magnetron to sputter copper in an argon atmosphere. The current-voltage characteristics of the magnetron are detailed in dc and pulsed dc conditions. The variations in optical emission from the excited species in the plasma are measured as a function of time during the applied pulses. The intensity of the argon emissions closely follows the variations of the target voltage but the different behavior of the copper emissions shows some evidence of self-sputtering of the target by copper ions. The energy and flux of the ions arriving at the substrate are measured as a function of time and it is shown that during pulsed operation, as the pulse off-period is extended, there are large increases in ion energy and ion flux. The initial overshoots in the target voltage cause a rapid expansion of the plasma sheath at the analyzer probe and wide variations in plasma potential leading to an initial pulse of high energy ions during the first 500 ns. The plasma potential then settles to {approx}40 eV and there is a second peak in ion flux at this energy with a peak at {approx}4000 ns due to the increased ion drift resulting from electron extraction from the target.

• OSTI ID: 20636958
• Journal Information: Journal of Vacuum Science and Technology. A, Vacuum, Surfaces and Films, Journal Name: Journal of Vacuum Science and Technology. A, Vacuum, Surfaces and Films Journal Issue: 1 Vol. 23; ISSN 0734-2101; ISSN JVTAD6
• Country of Publication: United States
• Language: English

Related Subjects

75 CONDENSED MATTER PHYSICS
SUPERCONDUCTIVITY AND SUPERFLUIDITY
COPPER
COPPER IONS
EV RANGE 10-100
ION DRIFT
MAGNETRONS
PLASMA EXPANSION
PLASMA POTENTIAL
PLASMA SHEATH
PULSED IRRADIATION
SPUTTERING
TIME DEPENDENCE