Rapid flash patterning of nanostructures

Journal Article · Mon Sep 06 00:00:00 EDT 2004 · Applied Physics Letters

DOI:https://doi.org/10.1063/1.1790588· OSTI ID:20632778

Yoon, Hyunsik; Lee, Kyoung Mi; Khang, Dahl-Young; Lee, Hong H; Choi, Se-Jin ^[1]

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1. School of Chemical Engineering, Seoul National University, Seoul, 151-742 (Korea, Republic of)

Sub-100 nm structures can be fabricated in tens of seconds with an aspect ratio much larger than unity by the general purpose patterning method presented here. A flexible film mold and a rapid flash heating with an infrared lamp are used in this nonphotolithographic patterning technique. Unlike other unconventional methods, the substrate surface can be made exposed and the resulting pattern height is sufficiently high for subsequent etching of the substrate.

• OSTI ID: 20632778
• Journal Information: Applied Physics Letters, Vol. 85, Issue 10; Other Information: DOI: 10.1063/1.1790588; (c) 2004 American Institute of Physics; Country of input: International Atomic Energy Agency (IAEA); ISSN 0003-6951
• Country of Publication: United States
• Language: English

Related Subjects

36 MATERIALS SCIENCE
ANNEALING
ASPECT RATIO
ETCHING
FLASH HEATING
LIGHT BULBS
NANOSTRUCTURES
POLYMERS
SUBSTRATES
THIN FILMS