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Title: Plasma drift and nonuniformity effects in plasma immersion ion implantation

Abstract

Measurements of the ion current collected by a substrate biased to high voltage have been carried out in plasma immersion ion implantation with a filtered vacuum arc plasma source. We have found that the ion saturation current increases with applied voltage and that this effect depends upon the angle of the normal to the substrate with respect to the plasma stream and on the distance of the substrate from the plasma duct exit. We also found that the ion current increases with increasing angle of the normal to the substrate with respect to the plasma stream. A model was developed for the sheath expansion in a nonuniform plasma with substantial ion drift velocity. We find that nonuniformity and high drift velocity lead to a decrease in sheath thickness. In a nonuniform plasma, the ion saturation current increases with applied voltage. The predictions of the model were found to be in good agreement with experiment. (c) 2000 American Institute of Physics.

Authors:
 [1];  [1];  [1]
  1. Lawrence Berkeley National Laboratory, MS 53, University of California, Berkeley, California 94720 (United States)
Publication Date:
OSTI Identifier:
20216493
Resource Type:
Journal Article
Journal Name:
Applied Physics Letters
Additional Journal Information:
Journal Volume: 76; Journal Issue: 21; Other Information: PBD: 22 May 2000; Journal ID: ISSN 0003-6951
Country of Publication:
United States
Language:
English
Subject:
70 PLASMA PHYSICS AND FUSION TECHNOLOGY; PLASMA DIAGNOSTICS; ION IMPLANTATION; PLASMA DRIFT; ELECTRIC ARCS; SUBSTRATES; PLASMA SHEATH; ION DENSITY; EXPERIMENTAL DATA

Citation Formats

Keidar, M., Monteiro, O. R., and Brown, I. G. Plasma drift and nonuniformity effects in plasma immersion ion implantation. United States: N. p., 2000. Web. doi:10.1063/1.126559.
Keidar, M., Monteiro, O. R., & Brown, I. G. Plasma drift and nonuniformity effects in plasma immersion ion implantation. United States. doi:10.1063/1.126559.
Keidar, M., Monteiro, O. R., and Brown, I. G. Mon . "Plasma drift and nonuniformity effects in plasma immersion ion implantation". United States. doi:10.1063/1.126559.
@article{osti_20216493,
title = {Plasma drift and nonuniformity effects in plasma immersion ion implantation},
author = {Keidar, M. and Monteiro, O. R. and Brown, I. G.},
abstractNote = {Measurements of the ion current collected by a substrate biased to high voltage have been carried out in plasma immersion ion implantation with a filtered vacuum arc plasma source. We have found that the ion saturation current increases with applied voltage and that this effect depends upon the angle of the normal to the substrate with respect to the plasma stream and on the distance of the substrate from the plasma duct exit. We also found that the ion current increases with increasing angle of the normal to the substrate with respect to the plasma stream. A model was developed for the sheath expansion in a nonuniform plasma with substantial ion drift velocity. We find that nonuniformity and high drift velocity lead to a decrease in sheath thickness. In a nonuniform plasma, the ion saturation current increases with applied voltage. The predictions of the model were found to be in good agreement with experiment. (c) 2000 American Institute of Physics.},
doi = {10.1063/1.126559},
journal = {Applied Physics Letters},
issn = {0003-6951},
number = 21,
volume = 76,
place = {United States},
year = {2000},
month = {5}
}