High quality AlN and GaN grown on Si(111) by gas source molecular beam epitaxy with ammonia
Conference
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OSTI ID:20104581
- and others
The authors describe the growth of high quality AlN and GaN on Si(111) by gas source molecular beam epitaxy (GSMBE) with ammonia (NH{sub 3}). The initial nucleation (at 1130--1190K) of an AlN monolayer with full substrate coverage resulted in a very rapid transition to two-dimensional (2D) growth mode of AlN. The rapid transition to the 2D growth mode of AlN is essential for the subsequent growth of high quality GaN, and complete elimination of cracking in thick (>2 {micro}m) GaN layers. The authors show, using Raman scattering (RS) and photoluminescence (PL) measurements, that the tensile stress in the GaN is due to thermal expansion mismatch, is below the ultimate strength of breaking of GaN, and produces a sizable shift in the bandgap. They show that the GSMBE AlN and GaN layers grown on Si can be used as a substrate for subsequent deposition of thick AlN and GaN layers by hydride vapor phase epitaxy (HVPE).
- Research Organization:
- Texas Tech Univ., Lubbock, TX (US)
- OSTI ID:
- 20104581
- Country of Publication:
- United States
- Language:
- English
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