Advanced low blaze angle x-ray gratings via nanoimprint replication and plasma etch

Voronov, Dmitriy L.; Park, Sooyeon; Gullikson, Eric M.; Salmassi, Farhad; Padmore, Howard A.

doi:10.1364/oe.495374

Advanced low blaze angle x-ray gratings via nanoimprint replication and plasma etch

Journal Article · Wed Jul 26 00:00:00 EDT 2023 · Optics Express

DOI:https://doi.org/10.1364/oe.495374· OSTI ID:2007181

Voronov, Dmitriy L. ^[1]; Park, Sooyeon ^[1]; Gullikson, Eric M. ^[1]; Salmassi, Farhad ^[1]; Padmore, Howard A. ^[1]

Lawrence Berkeley National Laboratory (LBNL), Berkeley, CA (United States)

We developed a new method of making ultra-low blaze angle diffraction gratings for x-ray applications. The method is based on reduction of the blaze angle of a master grating by nanoimprint replication followed by a plasma etch. A master blazed grating with a relatively large blaze angle is fabricated by anisotropic wet etching of a Si single crystal substrate. The surface of the master grating is replicated by a polymer material on top of a quartz substrate by nanoimprinting. Then a second nanoimprinting is performed using the 1st replica as a mold to replicate the saw-tooth surface into a resist layer on top of a Si grating substrate. A reactive ion etch is used to transfer the grating grooves into the Si substrate. The plasma etch provides reduction of the groove depth by a factor defined by the ratio of the etch rates for the resist and Si. We demonstrate reduction of the blaze angle of a master grating by a factor of 5 during fabrication of a 200 lines/mm blazed grating with a blaze angle of 0.2°. We investigated the quality and performance of the fabricated low blaze angle gratings and evaluate process accuracy and reproducibility. The new blaze angle reduction method preserves the planarity of the optical surface of the grating substrate and at the same time provides improvement in the grating groove quality during the reduction process.

View Accepted Manuscript (DOE)

Research Organization:: Lawrence Berkeley National Laboratory (LBNL), Berkeley, CA (United States)

Sponsoring Organization:: USDOE Office of Science (SC), Basic Energy Sciences (BES). Materials Sciences & Engineering Division (MSE)

Grant/Contract Number:: AC02-05CH11231

OSTI ID:: 2007181

Journal Information:: Optics Express, Journal Name: Optics Express Journal Issue: 16 Vol. 31; ISSN 1094-4087

Publisher:: Optical Society of America (OSA)Copyright Statement

Country of Publication:: United States

Language:: English

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