Plasma surface ionization wave interactions with single channels

Morsell, Joshua; Trosan, Duncan; Stapelmann, Katharina; Shannon, Steven

doi:10.1088/1361-6595/acf9c9

Plasma surface ionization wave interactions with single channels

Journal Article · Mon Sep 25 00:00:00 EDT 2023 · Plasma Sources Science and Technology

DOI:https://doi.org/10.1088/1361-6595/acf9c9· OSTI ID:2005018

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Abstract

The study of plasma surface ionization waves (SIWs) in recent years has primarily focused on planar surfaces and periodic two dimensional structures. In application, substrates are likely to have non-planar morphology such as cracks, pores, and steps. Additionally, targets for the applications of medicine or catalysis may have targets with heterogeneous composition. This classification of targets are brought under the umbrella of complex interfaces. In this work, plasma SIWs were incident on a complex target consisting of a single channel cut into glass slides. The SIW velocities for the in-channel portion of the wave and radially propagating portion of the wave were tracked. It was found that surface wave velocities are not significantly affected by channel geometry, but primarily increase with pulse energy. A third propagation direction for the SIW is characterized in the azimuthal direction relative to the radial portion of the wave. Channel geometry is found to greatly effect the area treated by the plasma but not the propagation velocity of the surface wave. Surface wave morphology and the impact on application is also discussed. A simple model was introduced to understand the mechanisms behind SIW escape from a channel. It was found that the ratio of pulse energy to a geometry dependent minimum energy can predict the escape angle of a SIW from single channels.

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Sponsoring Organization:: USDOE Office of Science (SC), Fusion Energy Sciences (FES)

Grant/Contract Number:: SC0020232

OSTI ID:: 2005018

Alternate ID(s):: OSTI ID: 2421491
OSTI ID: 2000192

Journal Information:: Plasma Sources Science and Technology, Journal Name: Plasma Sources Science and Technology Journal Issue: 9 Vol. 32; ISSN 0963-0252

Publisher:: IOP PublishingCopyright Statement

Country of Publication:: United Kingdom

Language:: English

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