Characteristics of molybdenum-containing a-C:H films deposited using electron cyclotron resonance CVD
Journal Article
·
· International Journal of Modern Physics B
Metal-containing carbon (Me-C:H) films are presently attracting wide interests due to their unique properties such as good adhesion, low resistivity and friction value. As a result, numerous techniques for depositing such films have been proposed. In this paper, a novel technique which involves the incorporation of two molybdenum (Mo) screen grids embedded in an electron cyclotron resonance chemical vapor deposition (ECR-CVD) system is presented. A set of film deposition experiments based on this screen grid sputtering technique has been carried out. The Mo-containing carbon films were characterized using x-ray diffraction (XRD), x-ray photoelectron spectroscopy (XPS). The changes in film resistivity were evaluated as a function of changes in the gas flow ratio (CH{sub 4}/Ar). XPS analysis showed that the fraction of Mo incorporated in the carbon film decreases drastically from 15.11% to 0.32% following an increase in the CH{sub 4}/Ar flow ratio. The film resistivity was found to increase by 11 orders of magnitude following the decrease in the metal fraction. It is found that Mo can exist in the forms of MoC, Mo{sub 2}C, Mo, and even MoO{sub 3} in the films, the last being mainly due to air exposure. The results showed that the ECR-based screen grid deposition technique for Me-C:H is highly effective and flexible with food control over the amount of metal incorporated.
- Research Organization:
- Nanyang Technological Univ. (SG)
- OSTI ID:
- 20023274
- Journal Information:
- International Journal of Modern Physics B, Journal Name: International Journal of Modern Physics B Journal Issue: 2-3 Vol. 14; ISSN IJPBEV; ISSN 0217-9792
- Country of Publication:
- United States
- Language:
- English
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