CVD mullite coatings in high-temperature, high-pressure air-H{sub 2}O[Chemical Vapor Deposition]
Crystalline mullite was deposited by chemical vapor deposition (CVD) onto SiC/SiC composites overlaid with CVD SiC. Specimens were exposed to isothermal oxidation tests in high-pressure air +H{sub 2}O at 1,200 C. Unprotected CVD SiC formed silica scales with a dense amorphous inner layer and a thick, porous, outer layer of cristobalite. Thin coatings ({approximately}2{mu}m) of dense CVD mullite effectively suppressed the rapid oxidation of CVD SiC. No microstructural evidence of mullite volatility was observed under these temperature, pressure, and low-flow-rate conditions. Results of this preliminary study indicate that dense, crystalline, high-purity CVD mullite is stable and protective in low-velocity, high-pressure, moisture-containing environments.
- Research Organization:
- Oak Ridge National Lab., TN (US)
- Sponsoring Organization:
- USDOE
- DOE Contract Number:
- AC05-96OR22464
- OSTI ID:
- 20020620
- Journal Information:
- Journal of the American Ceramic Society, Vol. 83, Issue 3; Other Information: PBD: Mar 2000; ISSN 0002-7820
- Country of Publication:
- United States
- Language:
- English
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