Effect of the application of a mechanical load on the oxide-layer microstructure and on the oxidation mechanism of Ni-20Cr foils

Journal Article · Sat Apr 01 04:00:00 EST 2000 · Oxidation of Metals

DOI:https://doi.org/10.1023/A:1004553623556· OSTI ID:20020598

Calvarin-Amiri, G; Molins, R; Huntz, A M

The effect of a tensile load on the oxidation kinetics and mechanism of Ni-20Cr was studied by comparison of the oxidation behavior of Ni-20Cr thin strips in air under classical conditions, i.e., without any applied mechanical load and under tensile creep at temperatures between 500 and 900 C. The study was performed mainly by comparisons of cross sections of oxidized samples observed by SEM. The results obtained clearly indicate that applying a tensile load induces an increase in the oxidation rate, does not modify the oxide-film morphology, but promotes the formation of internal oxidation at low temperatures, 500--600 C, and notably increases the thickness of the intermediate NiCr{sub 2}O{sub 4} layer at 900 C. This is related to the acceleration of anionic diffusion when a tensile load is applied, due to the formation of fast-diffusion by short-circuit paths.

• Research Organization: Univ. Paris XI, Orsay (FR)
• OSTI ID: 20020598
• Journal Information: Oxidation of Metals, Journal Name: Oxidation of Metals Journal Issue: 3-4 Vol. 53; ISSN OXMEAF; ISSN 0030-770X
• Country of Publication: United States
• Language: English

Related Subjects

36 MATERIALS SCIENCE
CHROMIUM ALLOYS
CREEP
DIFFUSION
ELECTRON MICROSCOPY
FOILS
KINETICS
MICROSTRUCTURE
NICKEL ALLOYS
OXIDATION
TEMPERATURE DEPENDENCE