Effects of surface porosity on tungsten trioxide (WO{sub 3}) films' electrochromic performance

Journal Article · Tue Feb 01 04:00:00 EST 2000 · Journal of Electronic Materials

DOI:https://doi.org/10.1007/s11664-000-0139-8· OSTI ID:20015607

Lee, W J; Fang, Y K; Ho, J J; Hsieh, W T; Ting, S F; Huang, Daoyang; Ho, F C

In this paper, the correlation between the electrochromic performance and the surface morphology of the tungsten trioxide (WO{sub 3}) thin films sputtered by dc reactive magnetron sputtering with widely varying target-substrate distances was investigated. It is found that the optical density change ({Delta}OD) of films is strongly affected by the target-substrate distance. The coloration efficiency (CE) at 633 nm was also found to be sensitive to the target-substrate distance, with 16 cm{sup 2}/C of film sputtered at 6 cm and 50 cm{sup 2}/C at 18 cm. X-ray diffraction showed that the crystal structure of films was amorphous. By using atomic force microscope to identify the surface porosity of the sputtered WO{sub 3} films, the authors found that the film at longer target-substrate distance was rough, porous, and having a cone-shaped columns morphology, this offering a good electrochromic performance for opto-switching applications.

• Research Organization: National Cheng Kung Univ., Tainan (TW)
• OSTI ID: 20015607
• Journal Information: Journal of Electronic Materials, Journal Name: Journal of Electronic Materials Journal Issue: 2 Vol. 29; ISSN JECMA5; ISSN 0361-5235
• Country of Publication: United States
• Language: English

Related Subjects

36 MATERIALS SCIENCE
ELECTROCHROMISM
POROSITY
ROUGHNESS
SAMPLE PREPARATION
SPUTTERING
THIN FILMS
TUNGSTEN OXIDES
X-RAY DIFFRACTION