Interface effects on the adhesion of thin aluminum films
Conference
·
OSTI ID:20015541
Differences in the adhesion and fracture toughness of aluminum films on sapphire due to the presence of controlled contaminants are being investigated. Adhesion is evaluated by use of nanoindentation and continuous scratch tests. A comparison was made of the properties of textured thin films of aluminum (178 to 1,890 nm) that were vapor deposited onto (0001) oriented sapphire substrates. A very thin (1 nm) layer of carbon was deposited at the interface of selected samples prior to the vapor deposition of the aluminum. Spalling was observed during continuous scratch testing in specimens with carbon at the interface but not in specimens without carbon at the interface.
- Research Organization:
- Sandia National Labs., Livermore, CA (US)
- OSTI ID:
- 20015541
- Country of Publication:
- United States
- Language:
- English
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